Persistent Link:
http://hdl.handle.net/10150/291600
Title:
Characterization of trapped particles in RF plasmas
Author:
Schabel, Michael Joseph, 1973-
Issue Date:
1997
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
Particle contamination in plasma processing is a serious and challenging issue for the semiconductor industry. In this work, Laser Doppler Velocimetry, Laser Light Scattering, and Optical Emission Spectroscopy are used to elucidate the physical behavior of particles trapped in a plasma. Coulomb theory is used to describe the motion of particles. The theory agreed very well with experimental data and was explored to evaluate conditions for which particle agglomeration is likely. Finally, it was observed that particles may fall out of the particle trap during plasma ignition and subsequently contaminate the substrate.
Type:
text; Thesis-Reproduction (electronic)
Keywords:
Physics, Fluid and Plasma.; Engineering, Materials Science.
Degree Name:
M.S.
Degree Level:
masters
Degree Program:
Graduate College; Materials Science and Engineering
Degree Grantor:
University of Arizona
Advisor:
Peterson, Thomas W.; Sinclair, Jennifer L.

Full metadata record

DC FieldValue Language
dc.language.isoen_USen_US
dc.titleCharacterization of trapped particles in RF plasmasen_US
dc.creatorSchabel, Michael Joseph, 1973-en_US
dc.contributor.authorSchabel, Michael Joseph, 1973-en_US
dc.date.issued1997en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractParticle contamination in plasma processing is a serious and challenging issue for the semiconductor industry. In this work, Laser Doppler Velocimetry, Laser Light Scattering, and Optical Emission Spectroscopy are used to elucidate the physical behavior of particles trapped in a plasma. Coulomb theory is used to describe the motion of particles. The theory agreed very well with experimental data and was explored to evaluate conditions for which particle agglomeration is likely. Finally, it was observed that particles may fall out of the particle trap during plasma ignition and subsequently contaminate the substrate.en_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
dc.subjectPhysics, Fluid and Plasma.en_US
dc.subjectEngineering, Materials Science.en_US
thesis.degree.nameM.S.en_US
thesis.degree.levelmastersen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineMaterials Science and Engineeringen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorPeterson, Thomas W.en_US
dc.contributor.advisorSinclair, Jennifer L.en_US
dc.identifier.proquest1386622en_US
dc.identifier.bibrecord.b37541389en_US
All Items in UA Campus Repository are protected by copyright, with all rights reserved, unless otherwise indicated.