Electrical characterization and plasma impedance measurements of a RF plasma etch system

Persistent Link:
http://hdl.handle.net/10150/291351
Title:
Electrical characterization and plasma impedance measurements of a RF plasma etch system
Author:
Roth, Weston Charles, 1970-
Issue Date:
1995
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
A modified Tegal MCR-1 plasma etch system has been electrically characterized, and the plasma impedance has been measured at 13.56MHz. Important aspects of radio-frequency (RF) impedance measurements are addressed as they pertain to the measurement of the plasma impedance. These include: transmission line effects, magnitude and phase errors of the measurement probes, and the intrinsic impedance of the empty plasma chamber. Plasma harmonics are discussed, and a technique for measuring the plasma impedance at harmonic frequencies is presented. Transients in the plasma impedance are observed during the first 5 minutes after the plasma is initiated, and represent a decrease in the plasma impedance. Residual gas analysis (RGA) confirms the presence of H₂O in the plasma. The H₂O ion current measured by RGA shows a downward transient similar to the impedance transients, suggesting a possible relationship between H₂O and the impedance transients. A possible explanation for these impedance transients is presented.
Type:
text; Thesis-Reproduction (electronic)
Keywords:
Engineering, Electronics and Electrical.
Degree Name:
M.S.
Degree Level:
masters
Degree Program:
Graduate College; Electrical and Computer Engineering
Degree Grantor:
University of Arizona
Advisor:
Carlile, Robert N.

Full metadata record

DC FieldValue Language
dc.language.isoen_USen_US
dc.titleElectrical characterization and plasma impedance measurements of a RF plasma etch systemen_US
dc.creatorRoth, Weston Charles, 1970-en_US
dc.contributor.authorRoth, Weston Charles, 1970-en_US
dc.date.issued1995en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractA modified Tegal MCR-1 plasma etch system has been electrically characterized, and the plasma impedance has been measured at 13.56MHz. Important aspects of radio-frequency (RF) impedance measurements are addressed as they pertain to the measurement of the plasma impedance. These include: transmission line effects, magnitude and phase errors of the measurement probes, and the intrinsic impedance of the empty plasma chamber. Plasma harmonics are discussed, and a technique for measuring the plasma impedance at harmonic frequencies is presented. Transients in the plasma impedance are observed during the first 5 minutes after the plasma is initiated, and represent a decrease in the plasma impedance. Residual gas analysis (RGA) confirms the presence of H₂O in the plasma. The H₂O ion current measured by RGA shows a downward transient similar to the impedance transients, suggesting a possible relationship between H₂O and the impedance transients. A possible explanation for these impedance transients is presented.en_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
dc.subjectEngineering, Electronics and Electrical.en_US
thesis.degree.nameM.S.en_US
thesis.degree.levelmastersen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineElectrical and Computer Engineeringen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorCarlile, Robert N.en_US
dc.identifier.proquest1376046en_US
dc.identifier.bibrecord.b3348529x9en_US
All Items in UA Campus Repository are protected by copyright, with all rights reserved, unless otherwise indicated.