The particle trap and plasma parameter studies in an RF argon discharge

Persistent Link:
http://hdl.handle.net/10150/288834
Title:
The particle trap and plasma parameter studies in an RF argon discharge
Author:
Kang, Jungwon, 1967-
Issue Date:
1997
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
Low pressure plasma discharges have been an important process in the manufacturing of microelectronics devices since the late seventies. Therefore, the knowledge and control of the physical and chemical phenomena in plasmas are important for reactor design and process development. In order to understand the process, it is necessary to be able to make accurate measurements of plasma parameters, such as charged particle density, electron temperature, and ion energy. There are three objectives in this research; the first objective is to develop a new automatic electrostatic probe system in order to make accurate measurements of plasma parameters such as plasma potential φ₀, electron temperature Tₑ, electron density nₑ, and electron energy distribution function (EEDF). The second objective is to investigate the forces acting on contaminant particle which can be generate during process. The final objective is to understand the physical nature of the plasma which is very sensitive to changes of processing variables such as rf power and pressure. It was discovered that both ion drag and electrostatic forces induce particle trapping. Additionally, over the range of processing variables explored, the mode of heating transited from ohmic to stochastic, resulting in a variation of the plasma parameters.
Type:
text; Dissertation-Reproduction (electronic)
Keywords:
Engineering, Electronics and Electrical.; Physics, Fluid and Plasma.
Degree Name:
Ph.D.
Degree Level:
doctoral
Degree Program:
Graduate College; Electrical and Computer Engineering
Degree Grantor:
University of Arizona
Advisor:
O'Hanlon, John F.

Full metadata record

DC FieldValue Language
dc.language.isoen_USen_US
dc.titleThe particle trap and plasma parameter studies in an RF argon dischargeen_US
dc.creatorKang, Jungwon, 1967-en_US
dc.contributor.authorKang, Jungwon, 1967-en_US
dc.date.issued1997en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractLow pressure plasma discharges have been an important process in the manufacturing of microelectronics devices since the late seventies. Therefore, the knowledge and control of the physical and chemical phenomena in plasmas are important for reactor design and process development. In order to understand the process, it is necessary to be able to make accurate measurements of plasma parameters, such as charged particle density, electron temperature, and ion energy. There are three objectives in this research; the first objective is to develop a new automatic electrostatic probe system in order to make accurate measurements of plasma parameters such as plasma potential φ₀, electron temperature Tₑ, electron density nₑ, and electron energy distribution function (EEDF). The second objective is to investigate the forces acting on contaminant particle which can be generate during process. The final objective is to understand the physical nature of the plasma which is very sensitive to changes of processing variables such as rf power and pressure. It was discovered that both ion drag and electrostatic forces induce particle trapping. Additionally, over the range of processing variables explored, the mode of heating transited from ohmic to stochastic, resulting in a variation of the plasma parameters.en_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
dc.subjectEngineering, Electronics and Electrical.en_US
dc.subjectPhysics, Fluid and Plasma.en_US
thesis.degree.namePh.D.en_US
thesis.degree.leveldoctoralen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.disciplineElectrical and Computer Engineeringen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorO'Hanlon, John F.en_US
dc.identifier.proquest9729441en_US
dc.identifier.bibrecord.b34796162en_US
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