Electrode material and geometry effects on the electrical properties of particle traps in a parallel plate plasma etch reactor

Persistent Link:
http://hdl.handle.net/10150/278287
Title:
Electrode material and geometry effects on the electrical properties of particle traps in a parallel plate plasma etch reactor
Author:
Collins, Sean Michael, 1959-
Issue Date:
1993
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
A newly designed Langmuir probe has been evaluated and was used to map the plasma potential near the powered electrode of a plasma etch chamber in 2 dimensions. Various electrode materials and geometries were used in order to investigate the relationship between electrode design and the presence of localized regions of elevated plasma potential. These regions of elevated plasma potential were known to be responsible for the presence of particle clouds suspended in the plasma during operation. A relationship was established between sharp edges on the powered electrode, insulating materials on the electrode and localized elevation in plasma potential. A thin layer of raised plasma potential has also been discovered at the plasma-sheath boundary. Suggestions for electrode design to reduce the presence of particles suspended in the plasma are made.
Type:
text; Thesis-Reproduction (electronic)
Keywords:
Engineering, Electronics and Electrical.; Physics, Electricity and Magnetism.; Physics, Fluid and Plasma.
Degree Name:
M.S.
Degree Level:
masters
Degree Program:
Graduate College
Degree Grantor:
University of Arizona
Advisor:
O'Hanlon, John F.

Full metadata record

DC FieldValue Language
dc.language.isoen_USen_US
dc.titleElectrode material and geometry effects on the electrical properties of particle traps in a parallel plate plasma etch reactoren_US
dc.creatorCollins, Sean Michael, 1959-en_US
dc.contributor.authorCollins, Sean Michael, 1959-en_US
dc.date.issued1993en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractA newly designed Langmuir probe has been evaluated and was used to map the plasma potential near the powered electrode of a plasma etch chamber in 2 dimensions. Various electrode materials and geometries were used in order to investigate the relationship between electrode design and the presence of localized regions of elevated plasma potential. These regions of elevated plasma potential were known to be responsible for the presence of particle clouds suspended in the plasma during operation. A relationship was established between sharp edges on the powered electrode, insulating materials on the electrode and localized elevation in plasma potential. A thin layer of raised plasma potential has also been discovered at the plasma-sheath boundary. Suggestions for electrode design to reduce the presence of particles suspended in the plasma are made.en_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
dc.subjectEngineering, Electronics and Electrical.en_US
dc.subjectPhysics, Electricity and Magnetism.en_US
dc.subjectPhysics, Fluid and Plasma.en_US
thesis.degree.nameM.S.en_US
thesis.degree.levelmastersen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorO'Hanlon, John F.en_US
dc.identifier.proquest1352334en_US
dc.identifier.bibrecord.b27086446en_US
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