Persistent Link:
http://hdl.handle.net/10150/277865
Title:
Characterization of an ultrahigh vacuum (UHV) sputtering system
Author:
Brownstein, Barry Scott, 1960-
Issue Date:
1991
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
Contamination from the gas source, target, or system can cause impurities to become incorporated in a sputtered film. These impurities can harm the sputtered film e.g., in terms of electromigration and microstructure properties. A custom-designed ultra-high vacuum sputtering system was constructed to study trace levels of background contaminants allowed by different pump combinations. Turbomolecular and cryogenic pumps each selectively aided by a LN2 trap and a titanium sublimation pump were used. Contamination was measured with RGAs at base pressures and at 1 mT. The main contaminants for the cryo-based system were air and hydrogen at ppb levels and for the turbo-based system were air and water at ppm levels. This was true at both high and low pressures. Also shown was the need for both open and closed ion source RGAs and the superior trace detection capability of the open source.
Type:
text; Thesis-Reproduction (electronic)
Keywords:
Applied Mechanics.; Engineering, Electronics and Electrical.
Degree Name:
M.S.
Degree Level:
masters
Degree Program:
Graduate College
Degree Grantor:
University of Arizona
Advisor:
O'Hanlon, John F.

Full metadata record

DC FieldValue Language
dc.language.isoen_USen_US
dc.titleCharacterization of an ultrahigh vacuum (UHV) sputtering systemen_US
dc.creatorBrownstein, Barry Scott, 1960-en_US
dc.contributor.authorBrownstein, Barry Scott, 1960-en_US
dc.date.issued1991en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractContamination from the gas source, target, or system can cause impurities to become incorporated in a sputtered film. These impurities can harm the sputtered film e.g., in terms of electromigration and microstructure properties. A custom-designed ultra-high vacuum sputtering system was constructed to study trace levels of background contaminants allowed by different pump combinations. Turbomolecular and cryogenic pumps each selectively aided by a LN2 trap and a titanium sublimation pump were used. Contamination was measured with RGAs at base pressures and at 1 mT. The main contaminants for the cryo-based system were air and hydrogen at ppb levels and for the turbo-based system were air and water at ppm levels. This was true at both high and low pressures. Also shown was the need for both open and closed ion source RGAs and the superior trace detection capability of the open source.en_US
dc.typetexten_US
dc.typeThesis-Reproduction (electronic)en_US
dc.subjectApplied Mechanics.en_US
dc.subjectEngineering, Electronics and Electrical.en_US
thesis.degree.nameM.S.en_US
thesis.degree.levelmastersen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorO'Hanlon, John F.en_US
dc.identifier.proquest1343802en_US
dc.identifier.bibrecord.b26882309en_US
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