Persistent Link:
http://hdl.handle.net/10150/252173
Title:
Modeling Advanced Oxidation Processes for Water Treatment
Author:
Anhalt, Ashley; Sáez, A. Eduardo; Arnold, Robert; Rojas, Mario
Affiliation:
Department of Chemical and Environmental Engineering
Issue Date:
2012-11-09
Rights:
Copyright © is held by the author. 
Collection Information:
This item is part of the GPSC Student Showcase collection. For more information about the Student Showcase, please email the GPSC (Graduate and Professional Student Council) at gpsc@email.arizona.edu.
Abstract:
Civilization is dependent on wastewater treatment plants. However, many conventional wastewater treatment processes only partially remove trace organics that result from human use, such as pharmaceuticals and endocrine disrupters. Advanced oxidation process (AOP) can be used to remove chemicals that may remain in the treated wastewater. AOP is an enhanced alternative to the traditional water treatment processes because it turns water contaminants into carbon dioxide (CO2), as opposed to simply transporting the contaminants across the different treatment phases. In order to model this process, one proposed idea uses ultraviolet light and hydrogen peroxide to oxidize the unwanted organic compounds. Previous mathematical models have been developed to simulate the UV/H2O2 process, however, the model employed in this work has advanced beyond previous efforts. Our UV/H2O2 model aims to characterize the mechanism and kinetics behind the decomposition of nonylphenol (NP) and p-cresol (PC), two chemicals in wastewater that serve as surrogates for endocrine disrupters. The model demonstrates agreement between experimental results and AOP simulations accounting for light intensity, pH, hydrogen peroxide levels, and concentrations of other radical scavengers. Our goal is to improve an already robust UV/H2O2 AOP model by taking into account spatial variations of radical concentrations. Our results take into account time and space, and show significant improvement in the accuracy of the model. This broadens the applications of this model and consequently, the degradation of organic contaminants is predictable over a wide range of conditions. The potential for polishing conventionally treated wastewater is evident.
Sponsors:
Western Alliance to Expand Student Opportunities (WAESO)

Full metadata record

DC FieldValue Language
dc.contributor.authorAnhalt, Ashleyen_US
dc.contributor.authorSáez, A. Eduardoen_US
dc.contributor.authorArnold, Roberten_US
dc.contributor.authorRojas, Marioen_US
dc.date.accessioned2012-11-14T23:49:01Z-
dc.date.available2012-11-14T23:49:01Z-
dc.date.issued2012-11-09-
dc.identifier.urihttp://hdl.handle.net/10150/252173-
dc.description.abstractCivilization is dependent on wastewater treatment plants. However, many conventional wastewater treatment processes only partially remove trace organics that result from human use, such as pharmaceuticals and endocrine disrupters. Advanced oxidation process (AOP) can be used to remove chemicals that may remain in the treated wastewater. AOP is an enhanced alternative to the traditional water treatment processes because it turns water contaminants into carbon dioxide (CO2), as opposed to simply transporting the contaminants across the different treatment phases. In order to model this process, one proposed idea uses ultraviolet light and hydrogen peroxide to oxidize the unwanted organic compounds. Previous mathematical models have been developed to simulate the UV/H2O2 process, however, the model employed in this work has advanced beyond previous efforts. Our UV/H2O2 model aims to characterize the mechanism and kinetics behind the decomposition of nonylphenol (NP) and p-cresol (PC), two chemicals in wastewater that serve as surrogates for endocrine disrupters. The model demonstrates agreement between experimental results and AOP simulations accounting for light intensity, pH, hydrogen peroxide levels, and concentrations of other radical scavengers. Our goal is to improve an already robust UV/H2O2 AOP model by taking into account spatial variations of radical concentrations. Our results take into account time and space, and show significant improvement in the accuracy of the model. This broadens the applications of this model and consequently, the degradation of organic contaminants is predictable over a wide range of conditions. The potential for polishing conventionally treated wastewater is evident.en_US
dc.description.sponsorshipWestern Alliance to Expand Student Opportunities (WAESO)en_US
dc.language.isoen_USen_US
dc.rightsCopyright © is held by the author. -
dc.titleModeling Advanced Oxidation Processes for Water Treatmenten_US
dc.contributor.departmentDepartment of Chemical and Environmental Engineeringen_US
dc.description.collectioninformationThis item is part of the GPSC Student Showcase collection. For more information about the Student Showcase, please email the GPSC (Graduate and Professional Student Council) at gpsc@email.arizona.edu.en_US
All Items in UA Campus Repository are protected by copyright, with all rights reserved, unless otherwise indicated.