Persistent Link:
http://hdl.handle.net/10150/187598
Title:
STRUCTURE-INDUCED OPTICAL ANISOTROPY IN THIN FILMS.
Author:
HOROWITZ, FLAVIO.
Issue Date:
1983
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
We consider in this work the contribution of anisotropic microstructure to polarization effects in thin films. The microstructure is pictured by a simple model as composed of identical columns with elliptical cross section elongated in a direction perpendicular to that of the vapor incidence. The asymmetry in columnar structure that results from oblique deposition is identified as the common source for the significant dichroism and birefringence observed in metal and dielectric films, respectively. A four-dimensional theory for multilayer systems is presented that starts from first principles, unifies previous treatments for particular cases of film anisotropy, and properly handles the most general case of elliptically polarized mode propagation. In this framework and from a set of polarimetric measurements, a simple method is devised, with explicit consideration of the anisotropic microstructure, for the determination of the physical thickness and principal refractive indices of a single dielectric film. A sequence of transmittance measurements is performed with a zirconium oxide film deposited at 65° and, substrate role and instrumental errors considered, good agreement is obtained between theory and experiment. Spectrophotometer data for a narrowband filter with 21 layers deposited at 30° is shown to confirm theoretical predictions of peak positions with Angstrom resolution. A hypothetical metal film is discussed that reproduces the essential features observed in the optical behavior of an aluminum film deposited at 85°. Potential applications and suggestions for future work are included.
Type:
text; Dissertation-Reproduction (electronic)
Keywords:
Anisotropy.; Optical films.; Thin films -- Optical properties.
Degree Name:
Ph.D.
Degree Level:
doctoral
Degree Program:
Optical Sciences; Graduate College
Degree Grantor:
University of Arizona
Advisor:
Macleod, Angus

Full metadata record

DC FieldValue Language
dc.language.isoenen_US
dc.titleSTRUCTURE-INDUCED OPTICAL ANISOTROPY IN THIN FILMS.en_US
dc.creatorHOROWITZ, FLAVIO.en_US
dc.contributor.authorHOROWITZ, FLAVIO.en_US
dc.date.issued1983en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractWe consider in this work the contribution of anisotropic microstructure to polarization effects in thin films. The microstructure is pictured by a simple model as composed of identical columns with elliptical cross section elongated in a direction perpendicular to that of the vapor incidence. The asymmetry in columnar structure that results from oblique deposition is identified as the common source for the significant dichroism and birefringence observed in metal and dielectric films, respectively. A four-dimensional theory for multilayer systems is presented that starts from first principles, unifies previous treatments for particular cases of film anisotropy, and properly handles the most general case of elliptically polarized mode propagation. In this framework and from a set of polarimetric measurements, a simple method is devised, with explicit consideration of the anisotropic microstructure, for the determination of the physical thickness and principal refractive indices of a single dielectric film. A sequence of transmittance measurements is performed with a zirconium oxide film deposited at 65° and, substrate role and instrumental errors considered, good agreement is obtained between theory and experiment. Spectrophotometer data for a narrowband filter with 21 layers deposited at 30° is shown to confirm theoretical predictions of peak positions with Angstrom resolution. A hypothetical metal film is discussed that reproduces the essential features observed in the optical behavior of an aluminum film deposited at 85°. Potential applications and suggestions for future work are included.en_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
dc.subjectAnisotropy.en_US
dc.subjectOptical films.en_US
dc.subjectThin films -- Optical properties.en_US
thesis.degree.namePh.D.en_US
thesis.degree.leveldoctoralen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorMacleod, Angusen_US
dc.contributor.committeememberBurke, Jamesen_US
dc.contributor.committeememberShack, Rolanden_US
dc.contributor.committeememberTurner, Francisen_US
dc.identifier.proquest8404668en_US
dc.identifier.oclc690636031en_US
All Items in UA Campus Repository are protected by copyright, with all rights reserved, unless otherwise indicated.