Fabrication and characterization of variable groove depth grating waveguide couplers.

Persistent Link:
http://hdl.handle.net/10150/186939
Title:
Fabrication and characterization of variable groove depth grating waveguide couplers.
Author:
Bates, Allen Keith.
Issue Date:
1994
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
Variable groove depth grating waveguide couplers (VGDGWCs) can be used to couple light into or out of planar waveguides. In principle an out-coupled light beam with any arbitrary irradiance profile can be obtained. VGDGWCs that produce out-coupled beams exhibiting a Gaussian irradiance profile are examined in this report. An expression for the grating groove depth variation necessary to produce Gaussian beams from VGDGWCs is derived. The design of a VGDGWC using two different materials for the host planar waveguide is presented. The designs are optimized with a consideration of the waveguide materials, the fabrication process, and the out-coupled beam quality. Two methods, that utilize ion etching to fabricate VGDGWCs are presented. Each method operates by limiting the cross sectional area of an ion beam. A scanning slit is used for one method and a moving variable width aperture is employed for the second. The ion etching process for each of the fabrication methods is characterized by a series of ion beam etching experiments. The results from the ion beam etching experiments are used to optimize the fabrication process. The variable width aperture fabrication method in combination with a post etching process, is found to produce the optimum results. The measured irradiance profile and the wavefront quality of the out-coupled beams from the fabricated VGDGWCs are compared to theory. The variable width aperture fabrication method is found to produce out-coupled beams with a nearly perfect Gaussian irradiance profile. The measured wavefront quality of out-coupled beams shows good agreement with theory.
Type:
text; Dissertation-Reproduction (electronic)
Degree Name:
Ph.D.
Degree Level:
doctoral
Degree Program:
Optical Sciences; Graduate College
Degree Grantor:
University of Arizona
Committee Chair:
Burke, James J.

Full metadata record

DC FieldValue Language
dc.language.isoenen_US
dc.titleFabrication and characterization of variable groove depth grating waveguide couplers.en_US
dc.creatorBates, Allen Keith.en_US
dc.contributor.authorBates, Allen Keith.en_US
dc.date.issued1994en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractVariable groove depth grating waveguide couplers (VGDGWCs) can be used to couple light into or out of planar waveguides. In principle an out-coupled light beam with any arbitrary irradiance profile can be obtained. VGDGWCs that produce out-coupled beams exhibiting a Gaussian irradiance profile are examined in this report. An expression for the grating groove depth variation necessary to produce Gaussian beams from VGDGWCs is derived. The design of a VGDGWC using two different materials for the host planar waveguide is presented. The designs are optimized with a consideration of the waveguide materials, the fabrication process, and the out-coupled beam quality. Two methods, that utilize ion etching to fabricate VGDGWCs are presented. Each method operates by limiting the cross sectional area of an ion beam. A scanning slit is used for one method and a moving variable width aperture is employed for the second. The ion etching process for each of the fabrication methods is characterized by a series of ion beam etching experiments. The results from the ion beam etching experiments are used to optimize the fabrication process. The variable width aperture fabrication method in combination with a post etching process, is found to produce the optimum results. The measured irradiance profile and the wavefront quality of the out-coupled beams from the fabricated VGDGWCs are compared to theory. The variable width aperture fabrication method is found to produce out-coupled beams with a nearly perfect Gaussian irradiance profile. The measured wavefront quality of out-coupled beams shows good agreement with theory.en_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
thesis.degree.namePh.D.en_US
thesis.degree.leveldoctoralen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.chairBurke, James J.en_US
dc.contributor.committeememberLawrence, George N.en_US
dc.contributor.committeememberLi, Lifengen_US
dc.identifier.proquest9517552en_US
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