Optical measurement of surface profiles of silicon dioxide films on silicon substrates and carbon coatings on magnetic disks.

Persistent Link:
http://hdl.handle.net/10150/185909
Title:
Optical measurement of surface profiles of silicon dioxide films on silicon substrates and carbon coatings on magnetic disks.
Author:
Hahn, Walter Gordon.
Issue Date:
1992
Publisher:
The University of Arizona.
Rights:
Copyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.
Abstract:
Current models for recovering the surface profile from optical measurements are inadequate for characterizing surfaces with optically dissimilar regions. This limitation in the model is evidenced in optical measurements of silicon dioxide films on silicon substrates, and carbon films on magnetic recording disk substrates. A new model that accounts for phase changes due to reflection at material boundaries is proposed, which involves measurements at several wavelengths in order to resolve these phase changes. Results of implementation of the new model are presented for silicon dioxide and carbon films.
Type:
text; Dissertation-Reproduction (electronic)
Keywords:
Dissertations, Academic.; Optics.; Materials science.
Degree Name:
Ph.D.
Degree Level:
doctoral
Degree Program:
Optical Sciences; Graduate College
Degree Grantor:
University of Arizona
Advisor:
Wyant, James C.

Full metadata record

DC FieldValue Language
dc.language.isoenen_US
dc.titleOptical measurement of surface profiles of silicon dioxide films on silicon substrates and carbon coatings on magnetic disks.en_US
dc.creatorHahn, Walter Gordon.en_US
dc.contributor.authorHahn, Walter Gordon.en_US
dc.date.issued1992en_US
dc.publisherThe University of Arizona.en_US
dc.rightsCopyright © is held by the author. Digital access to this material is made possible by the University Libraries, University of Arizona. Further transmission, reproduction or presentation (such as public display or performance) of protected items is prohibited except with permission of the author.en_US
dc.description.abstractCurrent models for recovering the surface profile from optical measurements are inadequate for characterizing surfaces with optically dissimilar regions. This limitation in the model is evidenced in optical measurements of silicon dioxide films on silicon substrates, and carbon films on magnetic recording disk substrates. A new model that accounts for phase changes due to reflection at material boundaries is proposed, which involves measurements at several wavelengths in order to resolve these phase changes. Results of implementation of the new model are presented for silicon dioxide and carbon films.en_US
dc.typetexten_US
dc.typeDissertation-Reproduction (electronic)en_US
dc.subjectDissertations, Academic.en_US
dc.subjectOptics.en_US
dc.subjectMaterials science.en_US
thesis.degree.namePh.D.en_US
thesis.degree.leveldoctoralen_US
thesis.degree.disciplineOptical Sciencesen_US
thesis.degree.disciplineGraduate Collegeen_US
thesis.degree.grantorUniversity of Arizonaen_US
dc.contributor.advisorWyant, James C.en_US
dc.contributor.committeememberShannon, Robert R.en_US
dc.contributor.committeememberMacleod, H. Angusen_US
dc.identifier.proquest9234904en_US
dc.identifier.oclc713030245en_US
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